Fluorine Ion



It exhibits high selectivity and sensitivity towards acetate ion or fluorine ion by using 1,2,4-triazol as anion binding site and pyridinium perchlorate as signaling group. The fluorescence emission of 1 can be effectively quenched upon addition of acetate ion or fluorine even in the presence of other interfering ions. The mechanism of. Fluorine is a halogen that exists under ordinary conditions as a pale yellow diatomic gas. The element is found in fluoridated water, toothpaste, and refrigerants. Here are facts about this interesting element. Electron Affinity of Fluorine is 328 kJ/mol. Electronegativity of Fluorine is 3.98. Electron Affinity. In chemistry and atomic physics, the electron affinity of an atom or molecule is defined as: the change in energy (in kJ/mole) of a neutral atom or molecule (in the gaseous phase) when an electron is added to the atom to form a negative ion.

Chemical properties of fluorine - Health effects of fluorine - Environmental effects of fluorine

9

Atomic mass

18.998403 g.mol -1

Electronegativity according to Pauling

4

Density

1.8*10-3 g.cm-3 at 20°C

Melting point

-219.6 °C

Boiling point

-188 °C

Vanderwaals radius

0.135 nm

Ionic radius

0.136 nm (-1) ; 0.007 (+7)

Isotopes

2

Electronic shell

[ He ] 2s22p5

Energy of first ionisation

1680.6 kJ.mol -1

Energy of second ionisation

3134 kJ.mol -1

Energy of third ionisation

6050 kJ mol-1

Standard potential

- 2.87 V

Discovered by

Moissan in 1886


Fluorine

Fluorine is an univalent poisonous gaseous halogen, it is pale yellow-green and it is the most chemically reactive and electronegative of all the elements. Fluorine readily forms compounds with most other elements, even with the noble gases krypton, xenon and radon. It is so reactive that glass, metals, and even water, as well as other substances, burn with a bright flame in a jet of fluorine gas.
In aqueous solution, fluorine commonly occurs as the fluoride ion F-. Fluorides are compounds that combine fluoride with some positively charged counterpart.

Applications

Atomic fluorine and molecular fluorine are used for plasma etching in semiconductor manufacturing, flat panel display production and MEMs fabrication.
Fluorine is indirectly used in the production of low friction plastics such as teflon and in halons such as freon, in the production of uranium. Fluorochlorohydrocarbons are used extensively in air conditioning and in refrigeration.
Fluorides are often added to toothpaste and, somewhat controversially, to municipal water supplies to prevent dental cavities. Fore more information visit our page on mineral water.

Fluorine in the environment

Annual world production of the mineral fluorite in around 4 million tonnes, and there are around 120 million tonnes of mineral reserves. The main mining areas for fluorite are China, Mexico and Western Europe.
Fluorine occurs naturally in the earth's crust where it can be found in rocks, coal and clay. Fluorides are released into the air in wind-blown soil. Fluorine is the 13th most aboundant element in the Earth's crust: 950 ppm are contanined in it. Soils contain approximatively 330 ppm of fluorine, ranging from 150 to 400 ppm. Some solis can have as much as 1000 ppm and contaminated solis have been found with 3500 ppm. Hydrogen fluorides can be released into air through combustion processes in the industry. Fluorides that are found in air will eventually drop onto land or into water. When fluorine is attached to very small particles it can remain in the air for a long period of time.
In the atmosphere 0.6 ppb of fluorine are present as salt spray and organicochloride compounds. Up to 50 ppb has been recorded in city environments.

Health effects of fluorine

Small amounts of fluorine are naturally present in water, air, plants and animals. As a result humans are exposed to fluorine through food and drinking water and by breathing air. Fluorine can be found in any kind of food in relatively small quantities. Large quantities of fluorine can be found in tea and shellfish.
Fluorine is essential for the maintenance of solidity of our bones. Fluorine can also protect us from dental decay, if it is applied through toothpaste twice a day. If fluorine is absorbed too frequently, it can cause teeth decay, osteoporosis and harm to kidneys, bones, nerves and muscles.
Fluorine gas is released in the industries. This gas is very dangerous, as it can cause death at very high concentrations. At low concentrations it causes eye and nose irritations.

Environmental effects of fluorine

When fluorine from the air ends up in water it will settle into the sediment. When it ends up in soils, fluorine will become strongly attached to soil particles. In the environment fluorine cannot be destroyed; it can only change form.
Fluorine that is located in soils may accumulate in plants. The amount of uptake by plants depends upon the type of plant and the type of soil and the amount and type of fluorine found in the soil. With plants that are sensitive for fluorine exposure even low concentrations of fluorine can cause leave damage and a decline in growth. Too much fluoride, wheater taken in form the soil by roots, or asdorbed from the atmosphere by the leaves, retards the growth of plants and reduces crop yields. Those more affected are corns and apricots.
Animals that eat fluorine-containing plants may accumulate large amounts of fluorine in their bodies. Fluorine primarily accumulates in bones. Consequently, animals that are exposed to high concentrations of fluorine suffer from dental decay and bone degradation. Too much fluorine can also cause the uptake of food from the paunch to decline and it can disturb the development of claws. Finally, it can cause low birth-weights.

Back to periodic chart.


More from 'Elements'

Lenntech (European Head Office)

Distributieweg 3
2645 EG Delfgauw
The Netherlands
Phone: +31 152 610 900
fax: +31 152 616 289
e-mail: info@lenntech.com

Ion
Fluorine

Facts About Fluorine

Fluorine Ion
Lenntech USA LLC (Americas)

5975 Sunset Drive
South Miami, FL 33143
USA
Phone: +1 877 453 8095
e-mail: info@lenntech.com


Lenntech DMCC (Middle East)

Level 5 - OFFICE #8-One JLT Tower
Jumeirah Lake Towers
Dubai - U.A.E.
Phone: +971 4 429 5853
e-mail: info@lenntech.com


Copyright © 1998-2021 Lenntech B.V. All rights reserved

  • Formula: F2
  • Molecular weight: 37.9968064
  • IUPAC Standard InChI:
    • InChI=1S/F2/c1-2
    • Download the identifier in a file.
  • IUPAC Standard InChIKey:PXGOKWXKJXAPGV-UHFFFAOYSA-N
  • CAS Registry Number: 7782-41-4
  • Chemical structure:
    This structure is also available as a 2d Mol fileor as a computed3d SD file
    The 3d structure may be viewed usingJavaorJavascript.
  • Permanent link for this species. Use this link for bookmarking this speciesfor future reference.
  • Information on this page:
  • Other data available:
  • Data at other public NIST sites:
  • Options:

Data at NIST subscription sites:

NIST subscription sites provide data under theNIST Standard ReferenceData Program, but require an annual fee to access.The purpose of the fee is to recover costs associatedwith the development of data collections included insuch sites. Your institution may already be a subscriber.Follow the links above to find out more about the datain these sites and their terms of usage.

Gas phase ion energetics data

Go To:Top, References, Notes

Data compilation copyrightby the U.S. Secretary of Commerce on behalf of the U.S.A.All rights reserved.

Data evaluated as indicated in comments:
HL - Edward P. Hunter and Sharon G. Lias
L - Sharon G. Lias

Data compiled as indicated in comments:
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
LL - Sharon G. Lias and Joel F. Liebman
B - John E. Bartmess

QuantityValueUnitsMethodReferenceComment
IE (evaluated)15.697 ± 0.003eVN/AN/AL
QuantityValueUnitsMethodReferenceComment
Proton affinity (review)332.kJ/molN/AHunter and Lias, 1998HL
QuantityValueUnitsMethodReferenceComment
Gas basicity305.5kJ/molN/AHunter and Lias, 1998HL

Electron affinity determinations

EA (eV)MethodReferenceComment
3.005 ± 0.071R-AWenthold and Squires, 1995EA fixed at 0K value, not 298K of heat of formation; B
3.120 ± 0.070CIDCArtau, Nizzi, et al., 2000B
3.07998ECDAyala, Wentworth, et al., 1981Vertical Detachment Energy: 1.24 eV; B
2.94 ± 0.20EIAEHarland and Franklin, 1974From NF3; B
2.90 ± 0.22EIAEDeCorpo and Franklin, 1971From BF3; B
3.16558EIAEWang and Franklin, 1980From SO2F2; B
>2.80 ± 0.30EIAEThynne, 1972From CF2O; B
3.08 ± 0.10EndoChupka, Berkowitz, et al., 1971B
>2.99997EIAEReese, Dibeter, et al., 1958From SO2F2; B

Ionization energy determinations

IE (eV)MethodReferenceComment
15.697 ± 0.003PEVan Lonkhuyzen and De Lange, 1984LBLHLM
15.70PEBieri, Schmelzer, et al., 1980LLK
15.694TEGuyon, Spohr, et al., 1976LLK
15.70 ± 0.02SGole and Margrave, 1972LLK
15.70 ± 0.01PEPotts and Price, 1971LLK
15.70PECornford, Frost, et al., 1971LLK
15.74PECornford, Frost, et al., 1971LLK
15.686 ± 0.006PIBerkowitz, Chupka, et al., 1971LLK
15.70PEAnderson, Mamantov, et al., 1971LLK
15.69 ± 0.01PIDibeler, Walker, et al., 1969RDSH
15.7SIczkowski and Margrave, 1959RDSH
15.70PEDyke, Josland, et al., 1984Vertical value; LBLHLM

Appearance energy determinations

IonAE (eV)Other ProductsMethodReferenceComment
F+15.2F-EIVeljkovic, Neskovic, et al., 1992LL
F+19.008FPIBerkowitz and Wahl, 1973LLK
F+15.6F-PIBerkowitz, Chupka, et al., 1971LLK
F+19.008FPIBerkowitz, Chupka, et al., 1971, 2LLK
F+15.48F-PIDibeler, Walker, et al., 1969RDSH

References

Go To:Top, Gas phase ion energetics data, Notes

Data compilation copyrightby the U.S. Secretary of Commerce on behalf of the U.S.A.All rights reserved.

Fluorine

Hunter and Lias, 1998
Hunter, E.P.; Lias, S.G.,Evaluated Gas Phase Basicities and Proton Affinities of Molecules: An Update,J. Phys. Chem. Ref. Data, 1998, 27, 3, 413-656, https://doi.org/10.1063/1.556018. [all data]

Wenthold and Squires, 1995
Wenthold, P.G.; Squires, R.R.,Bond dissociation energies of F2(-) and HF2(-). A gas-phase experimental and G2 theoretical study,J. Phys. Chem., 1995, 99, 7, 2002, https://doi.org/10.1021/j100007a034. [all data]

Artau, Nizzi, et al., 2000
Artau, A.; Nizzi, K.E.; Hill, B.T.; Sunderlin, L.S.; Wenthold, P.G.,Bond dissociation energy in trifluoride ion,J. Am. Chem. Soc., 2000, 122, 43, 10667-10670, https://doi.org/10.1021/ja001613e. [all data]

Ayala, Wentworth, et al., 1981
Ayala, J.A.; Wentworth, W.E.; Chen, E.C.M.,Electron attachment to halogens,J. Phys. Chem., 1981, 85, 768. [all data]

Harland and Franklin, 1974
Harland, P.W.; Franklin, J.L.,Partitioning of excess energy in dissociative resonance capture processes,J. Chem. Phys., 1974, 61, 1621. [all data]

DeCorpo and Franklin, 1971
DeCorpo, J.J.; Franklin, J.L.,Electron affinities of the halogen molecules by dissociative electron attachment,J. Chem. Phys., 1971, 54, 1885. [all data]

Wang and Franklin, 1980
Wang, J.-S.; Franklin, J.L.,Reactions and energy distributions in dissociative electron capture processes in sulfuryl halides,Int. J. Mass Spectrom. Ion Phys., 1980, 36, 233. [all data]

Thynne, 1972
Thynne, J.C.J.,Negative Ion Studies with a Time-of-Flight Mass Spectrometer.,Dyn. Mass Spectrom., 1972, 3, 67. [all data]

Chupka, Berkowitz, et al., 1971
Chupka, W.A.; Berkowitz, J.; Gutman, D.,Electron Affinities of Halogen Diatomic Molecules as Determined by Endoergic Charge Exchange,J. Chem. Phys., 1971, 55, 6, 2724, https://doi.org/10.1063/1.1676487. [all data]

Reese, Dibeter, et al., 1958
Reese, R.M.; Dibeter, V.H.; Franklin, J.L.,Electron impact studies of sulfur dioxide and sulfuryl fluoride,J. Chem. Phys., 1958, 29, 880. [all data]

Van Lonkhuyzen and De Lange, 1984
Van Lonkhuyzen, H.; De Lange, C.A.,High-resolution UV photoelectron spectroscopy of diatomic halogens,Chem. Phys., 1984, 89, 313. [all data]

Bieri, Schmelzer, et al., 1980
Bieri, G.; Schmelzer, A.; Asbrink, L.; Jonsson, M.,Fluorine and the fluoroderivatives of acetylene and diacetylene studied by 30.4 nm He(II) photoelectron spectroscopy,Chem. Phys., 1980, 49, 213. [all data]

Guyon, Spohr, et al., 1976
Guyon, P.-M.; Spohr, R.; Chupka, W.A.; Berkowitz, J.,Threshold photoelectron spectra of HF, DF, F2,J. Chem. Phys., 1976, 65, 1650. [all data]

Gole and Margrave, 1972
Gole, J.L.; Margrave, J.L.,The vacuum ultraviolet spectrum of molecular fluorine,J. Mol. Spectrosc., 1972, 43, 65. [all data]

Potts and Price, 1971
Potts, A.W.; Price, W.C.,Photoelectron spectra of the halogens and mixed halides ICI and lBr,J. Chem. Soc. Faraday Trans., 1971, 67, 1242. [all data]

Cornford, Frost, et al., 1971
Cornford, A.B.; Frost, D.C.; McDowell, C.A.; Ragle, J.L.; Stenhouse, I.A.,Photoelectron spectra of the halogens,J. Chem. Phys., 1971, 54, 2651. [all data]

Berkowitz, Chupka, et al., 1971
Berkowitz, J.; Chupka, W.A.; Guyon, P.M.; Holloway, J.H.; Spohr, R.,Photoionization mass spectrometric study of F2, HF, and DF,J. Chem. Phys., 1971, 54, 5165. [all data]

Anderson, Mamantov, et al., 1971
Anderson, C.P.; Mamantov, G.; Bull, W.E.; Grimm, F.A.; Carver, J.C.; Carlson, T.A.,Photoelectron spectrum of chlorine monofluoride,Chem. Phys. Lett., 1971, 12, 137. [all data]

Dibeler, Walker, et al., 1969
Dibeler, V.H.; Walker, J.A.; McCulloh, K.E.,Dissociation energy of fluorine,J. Chem. Phys., 1969, 50, 4592. [all data]

Iczkowski and Margrave, 1959
Iczkowski, R.P.; Margrave, J.L.,Absorption spectrum of fluorine in the vacuum ultraviolet,J. Chem. Phys., 1959, 30, 403. [all data]

Dyke, Josland, et al., 1984
Dyke, J.M.; Josland, G.D.; Snijders, J.G.; Boerrigter, P.M.,Ionization energies of the diatomic halogens and interhalogens studied with relativistic hartree-fock-slater calculations,Chem. Phys., 1984, 91, 419. [all data]

Fluorine Ion Atom

Veljkovic, Neskovic, et al., 1992
Veljkovic, M.V.; Neskovic, O.M.; Zmbov, K.F.,Mass spectrometric study of the thermal decomposition of F2,J. Serb. Chem. Soc., 1992, 57, 753. [all data]

Berkowitz and Wahl, 1973
Berkowitz, J.; Wahl, A.C.,The dissociation energy of fluorine,Adv. Fluorine Chem., 1973, 7, 147. [all data]

Fluorine Ion

Berkowitz, Chupka, et al., 1971, 2
Berkowitz, J.; Chupka, W.A.; Guyon, P.M.; Holloway, J.; Spohr, R.,Photo-ionization studies of F2, HF, DF, and the xenon fluorides,Advan. Mass Spectrom., 1971, 5, 112. [all data]

Fluorine Ion Protons

Notes

Go To:Top, Gas phase ion energetics data, References

Fluorine Ionization Energy

  • Symbols used in this document:
    AEAppearance energy
    EAElectron affinity
    IE (evaluated)Recommended ionization energy
  • Data from NIST Standard Reference Database 69:NIST Chemistry WebBook
  • The National Institute of Standards and Technology (NIST)uses its best efforts to deliver a high quality copy of theDatabase and to verify that the data contained therein havebeen selected on the basis of sound scientific judgment.However, NIST makes no warranties to that effect, and NISTshall not be liable for any damage that may result fromerrors or omissions in the Database.
  • Customer supportfor NIST Standard Reference Data products.